Welcome to eeplasma
eeplasma GmbH has been founded 2012 in Taufkirchen / Munich, Germany.
Our core business is to supply equipment manufacturers for semiconductor devices and MEMS with innovative, reliable and very service-friendly microwave plasma sources. Our remote plasma sources are the key elements of the equipment for photo resist removal, surface cleaning, as well as isotropic etch that are used in semiconductor- and MEMS production.
The outstanding features of the plasma sources are based on in-depth expertise of the company founders in microwave plasma and semiconductor process technology.
eeplasma GmbH keeps a very close relationship with its customers and supports them in process technology and new fields of applications.
Remote plasma sources
eeplasma GmbH can supply you with leading-edge remote plasma sources for semiconductor front end and back end of line photo-resist ashing and isotropic etch needs.
The microwave plasma source has a very high dissociation rate, a large process window, a very service-friendly design, a high process uptime and a very low cost of ownership.
Our remote plasma sources are well-established of many semiconductor companies in Europe, Asia and the US. Furthermore they are used for different etch and cleaning applications in roll to roll and PCB production.